http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-201739842-A

Outgoing Links

Predicate Object
assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_3ad4b57c92b7a93718427d586b4c5294
classificationCPCAdditional http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-265
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-405
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0048
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G77-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08J7-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L83-08
filingDate 2017-02-03-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_db9f7b0c42bc9c6f88dba59bbecc1875
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_821a7d1952ee03db7823b8dd557b5f80
publicationDate 2017-11-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-201739842-A
titleOfInvention Surface treatment composition and surface treatment method using the same
abstract An object of the present invention is to provide a surface treatment composition excellent in coatability, which can improve heat resistance of a resist pattern and reduce solubility in a solvent. Further, a surface treatment method of a photoresist pattern using the surface treatment composition and a method of forming a photoresist pattern using the surface treatment composition is provided. The solution of the present invention is a surface treatment composition of a photoresist pattern, which comprises a solvent and a polyoxyalkylene compound soluble in the solvent, and constitutes a ruthenium atom of the polyoxyalkylene compound. It is bonded to a nitrogen-substituted hydrocarbon group, and an atom directly bonded to the ruthenium atom in the aforementioned hydrocarbon group is a carbon atom. Further, there is a surface treatment method using the composition and a method of forming a photoresist pattern.
priorityDate 2016-02-04-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate Subject
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID468172510
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID458393110
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID418503779
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419558793
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID96917
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID457623688
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID6380
http://rdf.ncbi.nlm.nih.gov/pubchem/anatomy/ANATOMYID112591
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID458394811
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID79130
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID420624720
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559581
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419514263
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID453284053
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559541
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID10687
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID410534197
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419523132
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419490744
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID21843625
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID414004986
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID962
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID2723671
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID8165
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID424669377
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID8916
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID421170388
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419556970
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID222
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID57204623
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID415767689
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419544560
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID458393630
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID297
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID456171974
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID2879
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID40761
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419512635
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419579030
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419574652
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419521873
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559367
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID54218017
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID7018
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID458397310
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID413993004
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID406907632
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID53627726
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID10435
http://rdf.ncbi.nlm.nih.gov/pubchem/taxonomy/TAXID112591
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID458392451
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID947
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID423390483
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID141423777
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID5461123
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID413993019
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID13118631
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID335
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID5976
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID412798128
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID6326954
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID23950

Total number of triples: 81.