http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-201739842-A
Outgoing Links
Predicate | Object |
---|---|
assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_3ad4b57c92b7a93718427d586b4c5294 |
classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-265 |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-405 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0048 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G77-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08J7-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L83-08 |
filingDate | 2017-02-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_db9f7b0c42bc9c6f88dba59bbecc1875 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_821a7d1952ee03db7823b8dd557b5f80 |
publicationDate | 2017-11-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | TW-201739842-A |
titleOfInvention | Surface treatment composition and surface treatment method using the same |
abstract | An object of the present invention is to provide a surface treatment composition excellent in coatability, which can improve heat resistance of a resist pattern and reduce solubility in a solvent. Further, a surface treatment method of a photoresist pattern using the surface treatment composition and a method of forming a photoresist pattern using the surface treatment composition is provided. The solution of the present invention is a surface treatment composition of a photoresist pattern, which comprises a solvent and a polyoxyalkylene compound soluble in the solvent, and constitutes a ruthenium atom of the polyoxyalkylene compound. It is bonded to a nitrogen-substituted hydrocarbon group, and an atom directly bonded to the ruthenium atom in the aforementioned hydrocarbon group is a carbon atom. Further, there is a surface treatment method using the composition and a method of forming a photoresist pattern. |
priorityDate | 2016-02-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 81.