http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-201738339-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_a665d61597c2731ab4130971ee397dc9 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1436 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-30625 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09G1-02 |
| filingDate | 2017-03-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9ac073b61fba352827f25e625327f528 |
| publicationDate | 2017-11-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-201738339-A |
| titleOfInvention | Polishing composition, polishing method, and method of manufacturing semiconductor substrate |
| abstract | The present invention provides a polishing composition suitable for polishing an object to be polished having a layer containing a group III-V compound, capable of suppressing etching of a group III-V compound, and capable of polishing at a high polishing rate. The polishing composition according to the present invention is a polishing composition for polishing a polishing object having a layer containing a group III-V compound, comprising: abrasive grains, an oxidizing agent, and an anionic surfactant. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-114290229-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-114290229-B |
| priorityDate | 2016-03-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 171.