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publicationDate 2017-10-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-201737292-A
titleOfInvention Substrate processing method, substrate processing apparatus, and substrate processing system
abstract Provided is a substrate processing method which can be configured in a simple manner without reducing the yield to remove residual fluorine. In the program module, the wafer subjected to the COR treatment and the PHT treatment is exposed to the inside of the processing chamber of the cooling storage unit, and the humidity is adjusted to an atmosphere having a water content of 50 g/m 3 or more.
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