| abstract |
The present invention provides a monomer having a substituent which changes polarity due to an acid action, a polymer compound obtained from the monomer, a photoresist material containing the polymer compound as a base resin, and a pattern forming method using the photoresist material . a monomer represented by the following formula (1a) or (1b), a polymer compound containing a substituent which changes polarity due to an acid action, a photoresist material containing the polymer compound, and a pattern forming method using the photoresist material . □ |