http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-201736411-A
Outgoing Links
Predicate | Object |
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assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_424db9d56b06a23aed410fcf5df652f3 |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-52 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
filingDate | 2017-03-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ea0add81bb44226ce3a7adcf9dd82631 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3aa197a0faee499992f0da36115aa856 |
publicationDate | 2017-10-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | TW-201736411-A |
titleOfInvention | Photoresist material and pattern forming method |
abstract | The present invention provides a photoresist material which reduces acid diffusion and imparts a small and good pattern shape with a low edge roughness (LER, LWR) compared to a conventional photoresist material, and provides pattern formation using the photoresist material. method. A photoresist material comprising a base resin comprising a polymer having a weight average molecular weight of 1,000 to 500,000, the polymer comprising a repeating unit represented by the formula (a) and a repeating unit containing a group which changes polarity due to an acid. In the formula, R1 represents a hydrogen atom or a methyl group. R2 represents a hydrogen atom, a linear one having a carbon number of 1 to 8, a branched or cyclic alkyl group, a linear chain having a carbon number of 2 to 6, a branched or cyclic fluorenyl group, or a carbon number of 2 to 6. A linear, branched or cyclic alkoxycarbonyl group. X1 represents a single bond, a phenylene group, a naphthyl group, or a linking group having a carbon number of 1 to 12 which contains an ester group, an ether group or a lactone ring. a is a positive number that satisfies 0 < a < 1.0. |
priorityDate | 2016-03-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 283.