| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8cf8d77ac0eff1767b22d2fb9445b64d |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-334 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32449
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32082
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32174
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32715
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H1-46
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67207
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-455
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4558
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02315
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-6831
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67069
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45508
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32422
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32357
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0234
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3244 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-67
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-30 |
| filingDate |
2017-01-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e49dbea658ac5d33afd40c31ae19aad5
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_03586f2333d9e3e9e2b623dc299c6b8c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_206b2a0d649d84495c85a1ebb6f36aad
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_24b87277aabb6abb6289b31b70d7772a |
| publicationDate |
2017-10-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-201735136-A |
| titleOfInvention |
Substrate processing chamber with multiple gas injection points and dual injectors |
| abstract |
A gas injector for a substrate processing system includes a first syringe housing including: a base defining a first gas flow passage; a projection extending from the base; and a second gas flow passage extending through the base and the projection. The gas injector includes a second syringe housing including a first cavity including a first opening, a second opening, and a first plurality of gas passage holes disposed about the second opening. The first gas flow passage is in communication with the first plurality of gas passage holes. The second syringe housing includes a second cavity including a second plurality of gas passage holes and extending from the second opening of the first cavity. The second gas flow passage is in communication with the second plurality of gas passage holes. The gases in the first and second gas flow channels flow into the process chamber without mixing. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-112117176-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-112117176-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I747323-B |
| priorityDate |
2016-01-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |