| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5ac9ceb3271a9dae9056c7341439ef0a |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-031
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-085
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L33-06 |
| filingDate |
2016-11-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ae57c22763554a2f9ac5242731b774d1
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_55221520a50bb3b147ed5d08116422c4
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_df6f46c8499c6b9813c65c782b3015ef |
| publicationDate |
2017-10-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-201734643-A |
| titleOfInvention |
Negative photosensitive resin composition and photocurable pattern produced therefrom |
| abstract |
The present invention provides a negative photosensitive resin composition and an insulating film produced therefrom. The pattern produced by using the negative photosensitive resin composition of the present invention is excellent in chemical resistance and pencil hardness, excellent in durability, and excellent in transmittance, and therefore can be usefully used for the production of a photocurable pattern and having a manufactured therefrom. An image display device of a photo-curing pattern. |
| priorityDate |
2016-03-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |