Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_51d028c578ae85cb937b5b34a5129fbc |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2224-05647 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2224-05644 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2224-05624 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2224-05611 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2924-1434 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2224-13147 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2224-13144 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2924-1431 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2224-13139 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2224-08145 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2924-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2224-13116 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2924-13091 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2224-05186 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2224-13111 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2224-13109 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2224-05116 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2224-05147 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2224-05124 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L23-147 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L23-145 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L24-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76837 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2924-1304 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2224-03464 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2224-2919 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2924-1436 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L23-525 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2924-1432 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L23-53238 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2224-16225 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2224-05572 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L24-05 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L24-03 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L23-5385 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L23-5329 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L23-49894 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-768 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L23-528 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L23-522 |
filingDate |
2016-10-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0543096651fc131a3aa00be60fe0cb55 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3207e6788e2a1a404669b450896948ee http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e7d1727e74bc8eafc1d4ed2ee35ed0e5 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_95b7b422d408a7cf202d15b0b88882b8 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a03a7d70284e13c4a120b6331a4869a2 |
publicationDate |
2017-09-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
TW-201731056-A |
titleOfInvention |
Dielectric buffer layer |
abstract |
Embodiments disclosed herein relate to a method for forming an LMI landing pad on a wafer. The method includes forming a redistribution layer (RDL) on a substrate; forming a passivation layer covering the substrate and the RDL on the RDL and the substrate; forming a patterned dielectric material layer on the passivation layer; Processing the layer of patterned dielectric material to expose a portion of the passivation layer overlying the RDL; treating the portion of the passivation layer overlying the RDL to expose a portion of the RDL; and forming a portion on the exposed portion of the RDL LMI landing pad. The resulting wafer may include a redistribution line having a top portion and a sidewall portion; a passivation layer covering the sidewall portion; a dielectric layer covering the passivation layer; and a metal interface covering the top portion of the redistribution line . |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-112510004-A |
priorityDate |
2015-12-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |