http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-201730943-A

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filingDate 2017-01-24-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_075a212b8995dbaa735ee343655af1ba
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publicationDate 2017-09-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-201730943-A
titleOfInvention Film forming apparatus, film forming method, and non-transitory computer readable memory medium
abstract The film forming apparatus of the present invention is a film forming apparatus which sequentially supplies at least two types of reaction gases which react with each other to deposit a film on a substrate, and includes a rotary table which is rotatably provided in the container, and a recess having a through hole at the bottom is formed on the upper surface; the substrate supporting assembly is detachably mounted on the recess, and has a mounting portion for mounting the substrate thereon, and has a first protrusion on the lower surface; the driving mechanism Lifting and rotating the rotary table; the cover assembly is disposed in the container below the rotary table, and has a second protrusion on the upper surface; and the control portion is configured by the drive mechanism After the rotating table is lowered, the rotating table is rotated to bring the first protrusion into contact with the second protrusion, and the substrate supporting assembly is moved, so that the substrate supporting assembly rotates only a certain angle with respect to the rotating table. .
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I790703-B
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priorityDate 2016-01-26-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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