| abstract |
The present invention provides a resist composition, a resist film using the same, and a method of producing an electronic device, in particular, a resist composition containing a resin (A) When a pattern of ultrafine (for example, a line width of 50 nm or less) is formed, a pattern excellent in pattern collapse property can be formed, the resin (A) comprising a repeating unit (a) having an aromatic ring group and having a fluorene in the side chain Repeating unit of atom (b). |