Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_097405822d505467fd50f7100022cd56 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01B13-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D11-10 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D133-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D7-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D9-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01B5-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K13-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01B13-00 |
filingDate |
2016-10-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0d0b64003d036b1a7abafd77c93465b6 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_74904a14d33a9e8d17dff5caa0b7075e |
publicationDate |
2017-09-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
TW-201730292-A |
titleOfInvention |
Patterning method for invisible etching ink and conductive polymer for conductive polymer |
abstract |
An object of the present invention is to provide a stealth etching ink which is excellent in drying property and cleaning property when a conductive polymer film is deactivated, and a patterning method using a conductive polymer using the invisible etching ink. The solution is a conductive polymer containing an etchant (A) for conductive polymer, inorganic particles (B), polyacrylic acid or a salt thereof (C), and an aqueous medium (D) and having a pH adjusted to 3 to 7. The invisible etching ink is used to solve the aforementioned problems. |
priorityDate |
2015-11-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |