http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-201730261-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2baf849d216e689ecc40ccc931a7a7bc |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-382 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2006 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G63-181 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-168 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-162 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-322 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-343 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-36 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-385 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D167-03 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F228-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-38 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L25-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate | 2016-11-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2d338fa9da212910df6f0916095817b8 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a711bc3b636d50759f45fe96daf5a02d |
| publicationDate | 2017-09-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-201730261-A |
| titleOfInvention | Resist agent underlayer film forming composition additive and resisting agent underlayer film forming composition containing the same |
| abstract | An object of the present invention is to provide a novel additive for a resist underlayer film forming composition and a resist underlayer film forming composition containing the additive. The solution of the present invention is an additive for a resist underlayer film forming composition comprising a copolymer having a structural unit represented by the following formulas (1) to (3). A lithographic resist underlayer film forming composition comprising the above-mentioned additive, a resin different from the copolymer, an organic acid, a crosslinking agent and a solvent, and the content of the copolymer is 3 with respect to 100 parts by mass of the resin Parts by mass ~ 40 parts by mass. □ (wherein R1 each independently represents a hydrogen atom or a methyl group, R2 represents an alkylene group having 1 to 3 carbon atoms, A represents a protecting group, and R3 represents a lactone skeleton having a 4-membered ring to a 7-membered ring, and a diamond An organic group of an alkane skeleton, a tricyclodecane skeleton or a norbornane skeleton, wherein R4 is at least one hydrogen atom substituted by a fluorine group, and may have at least one hydroxyl group as a substituent, and has a linear chain of 1 to 12 carbon atoms. a branched, branched or cyclic organic group). |
| priorityDate | 2015-11-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 195.