| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-304
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-027 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40 |
| filingDate |
2016-06-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3d6af8dd7c0cc87e9165369a4681065f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ea0ac96f61e2222852f331ec0ed094e4
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c5f062567583e1ff4197aee7ca9cc5a5 |
| publicationDate |
2017-08-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-201727397-A |
| titleOfInvention |
Pattern forming method and method of manufacturing electronic device |
| abstract |
The present invention provides a pattern forming method and a method of manufacturing an electronic device. The pattern forming method of the present invention has a resist film forming process in which a photoresist film is formed using a sensitizing ray-sensitive or radiation-sensitive composition; an exposure process is performed to expose the resist film; and a film containing Hansen is used. a developing solution of an organic solvent having a solubility parameter δp of 2.9 or more and 5 or less, a process for developing the exposed resist film; and using an organic solvent containing at least one of a fluorine atom and a ruthenium atom. A rinse solution for rinsing the developed resist film. The method of manufacturing an electronic device includes the above-described pattern forming method. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I772552-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-111683993-A |
| priorityDate |
2015-06-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |