http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-201723649-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1af8df51ce24ca931ae718fb747f6aa0 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C59-022 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-028 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-38 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-162 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0002 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B29C59-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B29C37-00 |
| filingDate | 2016-08-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0de78db2b49186c71fcb7cdd2f1bcea5 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a4a27a932caaa3821e0324178830105a http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_816b0f1451639cc7d117394ad0744dec |
| publicationDate | 2017-07-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-201723649-A |
| titleOfInvention | Substrate pretreatment for shortening the filling time in nanoimprint microdisplay |
| abstract | A nanoimprint lithography method includes disposing a pretreatment composition on a substrate to form a pretreatment coating. The pretreatment composition comprises a polymerizable component. A separate portion of the imprint resist is disposed on the pretreatment coating, and each of the separate imprinted photoresist materials partially covers a target area of the substrate. A synthetic polymerizable coating is formed on the substrate as each discrete embossed photoresist material partially expands beyond its target area. The synthetic polymerizable coating comprises a mixture of the pretreatment composition and the imprinted photoresist material. The synthetic polymerizable coating is contacted with a template and polymerized to produce a synthetic polymeric layer on the substrate. The interfacial surface energy between the pretreatment composition and the air is greater than the interfacial energy between the imprinted photoresist material and the air or between at least one component of the imprinted photoresist material and the air. |
| priorityDate | 2015-09-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 245.