http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-201723640-A
Outgoing Links
Predicate | Object |
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assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_24a9b4f9b1a186ed70ead316d6c10c5e |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-62 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-22 |
filingDate | 2015-12-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_877ec1cd20a3e884a6345c2063517b30 |
publicationDate | 2017-07-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | TW-201723640-A |
titleOfInvention | EUV reticle inorganic protective film assembly manufacturing method |
abstract | The invention relates to a method for manufacturing an EUV reticle inorganic protective film module, which is obtained by taking a copper foil, and the edge of the copper foil is sandwiched by a large frame and a small frame, and then placed in a quartz glass tube and heated by methane. Forming a thin layer of graphite on the surface of the copper foil, and then sandwiching the large and small frame, and depositing a first tantalum nitride layer on the surface of the graphite thin layer to form a surface on the surface of the first tantalum nitride layer a perfluoropolymer layer, and a temporary frame is adhered to the surface of the perfluoropolymer layer via an organic colloid, and the copper foil is dissolved and disappeared by a ferric chloride lotion, and on the other surface of the graphite thin layer Depositing a second layer of tantalum nitride, and then adhering a main frame to the other surface of the second layer of tantalum nitride layer, the temporary frame is removed, and a perfluorocarbon is removed. The solvent removes the perfluoropolymer layer to form an EUV photomask inorganic protective film module. |
priorityDate | 2015-12-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 26.