| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_a8dcab124639472d352cd77822e4be46 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-006
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-3365
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-055
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-022
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-31701
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-0492 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B08B9-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32862
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32412
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3178
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32422
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32614
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32357
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3244
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3171
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J27-14 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-317
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-04 |
| filingDate |
2016-10-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e4a5596a542da0686233aaa07819cd9f |
| publicationDate |
2017-06-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-201721700-A |
| titleOfInvention |
Ion generating device and method for controlling ion generating device |
| abstract |
The present invention provides an ion generating apparatus and a control method thereof which contribute to improvement in productivity of an ion irradiation apparatus. The ion generating apparatus of the present invention includes an ion source control unit (102) configured to control the gas supply unit (70) and the plasma excitation source (72) in accordance with the current ion source conditions and the new ion source conditions applied after the current ion source conditions. a retention time acquisition unit (104) that acquires a hold time of the current ion source condition; and a pre-condition setting unit (106) configured to determine the pre-processing according to the current ion source condition, the hold time, and the new ion source condition. The pretreatment conditions are used to form a surface region suitable for a new ion source condition in the interior wall of the plasma. The ion source control unit (102) is configured to control the gas supply unit (70) and the plasma excitation source (72) by the pretreatment conditions when the current ion source condition is changed to the new ion source condition. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I795448-B |
| priorityDate |
2015-11-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |