| abstract |
The present invention provides a ruthenium-containing condensate which is a composition for forming a ruthenium-containing underlayer film which can form a photoresist underlayer film which has good adhesion to any resist pattern regardless of negative development or positive development. An antimony-containing condensate comprising any one of the repeating unit represented by the following formula (A1), the repeating unit represented by the following formula (A2), and the repeating unit represented by the following formula (A3). In the formula, R1 represents a group represented by the following formula (A-1) or the following formula (A-2). R2 and R3 are the same as the group of R1 or a hydrogen atom or a monovalent organic group having 1 to 30 carbon atoms other than R1. □ |