Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2f94790cf5bf17ef5799ba79a953aa57 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0234 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67207 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02315 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L28-60 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67745 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-285 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-44 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-30 |
filingDate |
2016-07-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_275ce6910fa637429c9b2964aa6c72ab http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2ae04c04026cdf5aca5300d5f31dcc5a http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d75c13883c9e5c2c48edcc3b77785176 |
publicationDate |
2017-05-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
TW-201716618-A |
titleOfInvention |
Capacitor deposition apparatus and deposition method of dielectric layer using the same |
abstract |
A method of manufacturing a capacitor having a high dielectric constant prevents the surface of the dielectric layer from being deteriorated due to vacuum breakage, and prevents the quality of the dielectric layer from being deteriorated due to physical stress when loading and unloading the semiconductor substrate. |
priorityDate |
2015-07-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |