http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-201712752-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8cf8d77ac0eff1767b22d2fb9445b64d |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67034 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02046 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02274 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02118 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02601 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02315 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3105 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02 |
| filingDate | 2016-06-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_37efce90b8eb75938637fafe0237df1d http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1211bdacc119b1b792626fbfd5780fe5 |
| publicationDate | 2017-04-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-201712752-A |
| titleOfInvention | Drying method for high aspect ratio structure without causing collapse |
| abstract | The method of drying a substrate including a plurality of high aspect ratio (HAR) structures includes the steps of: using at least one of (a) a wet etching solution, (b) a wet cleaning solution, and (c) a wet rinsing solution, respectively. After performing at least one of (i) wet etching, (ii) wet cleaning, and (iii) wet rinsing on the substrate, and without drying the substrate: depositing a solution between the plurality of HAR structures The deposition solution includes a polymer component, a nanoparticle component, and a solvent; wherein when the solvent is volatilized, the sacrificial support material is precipitated from the solution and at least partially filled with the plurality of HAR structures, and the sacrificial support material comprises: (i) a polymer a material, a polymer component from the solution; and (ii) a nanoparticulate material, a nanoparticulate component from the solution; and exposing the substrate to a plasma generated using plasma gas chemistry to volatilize the sacrificial support material. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11260431-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I760091-B |
| priorityDate | 2015-06-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 30.