| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_dc3e639586089fe232d0cfb27383c875 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76814
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-3341 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02315
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-304
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02046
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-68714
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02068
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-768
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67017
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31116 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-321 |
| filingDate |
2016-08-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ab743417a5bf059dc466faea9cdf9d69
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4a2c56677701cde5cda36f863f9f8284
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_382cd35f98cf8baedba5028deb31b549
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_777d6a09efb2115ef246171088cea4e1 |
| publicationDate |
2017-03-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-201709331-A |
| titleOfInvention |
Substrate processing method and substrate processing device |
| abstract |
A substrate processing apparatus (10) according to the present invention includes: a housing portion (11) for housing a substrate (S); a gas supply portion (13) for supplying a gas for generating plasma; and generating electricity from a gas for generating plasma The slurry is supplied to the plasma supply unit (12) of the accommodating portion (11). The gas for generating the plasma contains at least one of a nitrogen atom and an oxygen atom. The gas supply unit (13) supplies the gas for generating the plasma to the plasma supply unit (12) so that the ratio of the flow rate of the additive gas to the flow rate of the hydrogen gas is 1/500 or more. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I713133-B |
| priorityDate |
2015-08-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |