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publicationDate 2017-01-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-201702416-A
titleOfInvention Method for depositing low-k and low-wet etch rate dielectric films
abstract This case describes a method for forming SiCN, SiCO, and SiCON films, which includes cyclic exposure of a substrate surface to a helium-containing gas, a carbon-containing gas, and a plasma. Some embodiments further include adding an oxidizing agent prior to at least plasma exposure.
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