http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-201702408-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_a809a8b584124a0e40a92216366adef2 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32155 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32119 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-547 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32036 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-0078 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-54 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-00 |
| filingDate | 2016-03-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_110e1f52df1bd12467ca0d89b515c188 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e63b390b484f1bf48b9a42df02e2d17c |
| publicationDate | 2017-01-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-201702408-A |
| titleOfInvention | Method for producing a substrate having a plasma-coated surface and apparatus for performing the same |
| abstract | The present invention relates to a method for producing a substrate having a plasma coated surface of a dielectric coating material in a vacuum chamber, the vacuum chamber having a plasma device operated by alternating current, the method Causing a substrate to be moved relative to the plasma device along a curve by means of a moving device, and by means of the plasma device, a coating material is applied in a coating region along a track on a surface of the substrate Deposited on the surface of the substrate. The following is envisaged in this case: a) determining the actual value of the layer thickness of one of the deposited coating materials on at least a portion of the trajectory in the direction of movement of the substrate, b) comparing at least portions of the trajectory The actual value and the expected value of the thickness of the layer, c) determining the parameters of the plasma device for varying the amount of coating material deposited per unit time depending on the position of the substrate such that the deposited coating material The actual values of the layer thickness deviate from the expected values by less than a predetermined difference, d) the parameters of the plasma device are set according to item c) for changing the per unit timenThe amount of coating material accumulated, and e) the coating material is deposited by means of the plasma device using the parameters set forth in item d).nThe invention also relates to a device for producing a substrate (10, 100) having a plasma coated surface of a dielectric coating material in a vacuum chamber, the vacuum chamber having one of operating with alternating current a plasma device (31, 32, 150, 180) comprising a mobile device for moving a substrate (10, 100) relative to the plasma device (31, 32, 150, 180) along a curve Where the deposition of the coating material is by means of the plasma device (31, 32, 150, 180) along a trajectory (12, 105) located on one of the surfaces (11, 101) of the substrate (10, 100) On a surface of the substrate in a coating zone, the apparatus includes a control module (140) that is designed and arranged to perform the method. |
| priorityDate | 2015-03-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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