http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-201701741-A

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filingDate 2016-06-02-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ab0b9a77c800adedd115b78c668d98de
publicationDate 2017-01-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-201701741-A
titleOfInvention Substrate manufacturing method and laser processing device
abstract The present invention provides a substrate manufacturing method which can improve the utilization efficiency of laser energy without increasing the coating precision of a material for absorbing light energy of an infrared laser. A surface layer film is formed on a surface conductor layer of a substrate including a laminated structure in which an inner conductor layer, an insulating layer, and a surface conductor layer are stacked in this order by applying a liquid material that absorbs a surface film of light having a wavelength of an infrared region. In a plan view, under the condition that the beam spot is placed inside the surface film, a through hole is formed in the surface conductor layer and the insulating layer by the laser beam incident on the surface film in the infrared region.
priorityDate 2015-06-03-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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Total number of triples: 26.