| abstract |
A method for patterning a photolithographic technique, comprising the steps of: providing a substrate; forming a layer of material over the substrate; exposing one of the layers of the material to radiation; and removing one of the layers of the material in the developer The exposed portion produces a layer of patterned material. The developer has a Log P value greater than 1.82 and contains an organic solvent. In one embodiment, the organic solvent is a n-butyl acetate derivative represented by the chemical formula CH3R5CHR4CHR3CHR2COOCH2R1, wherein R1, R2, R3, R4, and R5 are each selected from the group consisting of hydrogen groups, methyl groups, and B groups. Base, and fluoroalkyl. |