http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-201700706-A

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publicationDate 2017-01-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-201700706-A
titleOfInvention Chemical mechanical polishing (CMP) composition for high efficiency polishing of ruthenium-containing substrates
abstract The present invention relates to a chemical mechanical polishing (CMP) composition (Q) comprising:n(A) inorganic particles,n(B) a compound of the formula (I)n□ (C) aqueous mediumnWherein the composition (Q) has a pH of 2 to 6.
priorityDate 2014-12-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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