abstract |
It is an object of the present invention to provide a photoresist composition which can produce a photoresist pattern having good shape and good crack resistance. A photoresist composition comprising: a resin having an acid labile group, a resin containing a structural unit represented by the formula (I), an acid generator, and a solvent.n□ [wherein, Ri41 is a hydrogen atom or a methyl group; Ri42 is a fluorenyl group or a hydrogen atom having 2 to 7 carbon atoms; a hydrocarbon group having 1 to 10 carbon atoms which may be substituted by a hydroxyl group; and Ri43 is an alkyl group having 1 to 6 carbon atoms; Or an alkoxy group having a carbon number of 1 to 6; p is an integer of 0 to 4; and Z represents a divalent hydrocarbon group having a carbon number of 3 to 20 containing a group represented by the formula (Ia), and the methylene group of the hydrocarbon group may be oxygenated Atom, sulfur atom, carbonyl substitution. * is a bonding bond with an oxygen atom; w and r each independently represent an integer of 1 to 10, wherein, when w is 1, Ri42 is a fluorenyl group having 2 to 7 carbon atoms. ] |