http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-201643269-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_3b74e149091c89a4825ef0db8d431755 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32834 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-513 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32633 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-455 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-50 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-455 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-513 |
| filingDate | 2016-03-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_22e8ce90fb0202aab144119f5a452262 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0cb938bca5ec4e533a5c034c4d7ce1e1 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8982a96152a4cf6bcf3478b8b8a0c0ef http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_79f9d7ba4ab7396c37c6b9c965a666aa http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_00131868df2aff9bf48eb0ed422d5fd9 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8f2a99e30d0f15f576be75e89faac5b5 |
| publicationDate | 2016-12-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-201643269-A |
| titleOfInvention | Plasma enhanced chemical vapor deposition device and method |
| abstract | According to the present invention, there is provided a plasma enhanced chemical vapor deposition (PE-CVD) apparatus, the apparatus comprising: a chamber comprising a circumferential pumping passage; a substrate support disposed within the chamber; one or more gases An inlet for introducing a gas into the chamber; a plasma generating device for generating a plasma in the chamber; and an upper member and a lower member, the upper member and the lower member being positioned in the chamber Wherein: the upper member is spaced apart from the substrate support to constrain the plasma and define a first circumferential pumping gap, and the upper member acts as a radially inward wall of the circumferential pumping passage; and the upper member and The lower member is radially spaced apart to define a second circumferential pumping gap that acts as an inlet to the circumferential pumping passage, wherein the second circumferential pumping gap is greater than the first circumferential pumping gap Wider. |
| priorityDate | 2015-03-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 28.