| abstract |
The present invention provides a pattern forming method and an electronic device manufactured using the same, which is capable of obtaining excellent adhesion between layers of a photoresist film, imparting a high-definition pattern, and exhibiting gas barrier properties and resistance. A laminate having high solvent properties.nThe method includes the steps (1) of forming a film using a composition on a support, and an exposure step (2) of irradiating a predetermined portion of the film with an active energy ray to change a developing portion of a predetermined portion, and a development film. The pattern forming method of the developing step (3) of the type, and the composition is a composition in which the solubility of the developing solution is different from each other, and the pattern obtained has a multilayer structure. |