| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_eedd2a00c4d0ba56ecf05fb4b97592dd |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-027 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-032
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C03C15-00 |
| filingDate |
2016-03-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_76c9f3136ff5711f2634cf38e25fb1dc
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_99e14864383dd815f41610011b569b6e |
| publicationDate |
2016-12-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-201642037-A |
| titleOfInvention |
Etch resist composition and dry film |
| abstract |
An etching resist composition capable of forming an etching resist film excellent in hydrogen fluoride resistance and a dry film having a resin layer obtained from the composition are provided.nAn etching resist composition characterized by containing an alkali-soluble resin having a biphenyl structure, and a dry film having a resin layer obtained from the composition. |
| priorityDate |
2015-03-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |