Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_0606c8e113c860d8a6c41e2aaaf3120d |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02F1-1362 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0085 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-008 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-786 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L27-13 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02F1-1368 |
filingDate |
2015-05-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_18f47657288576cd97fe9241f67013cb http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5aee4d63c4f331a8069b56f720059b39 |
publicationDate |
2016-12-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
TW-201642032-A |
titleOfInvention |
Positive type photosensitive resin composition and pattern forming method thereof |
abstract |
The present invention relates to a positive photosensitive resin composition comprising a novolac resin (A), an ester of an o-naphthoquinonediazidesulfonic acid (B), and an amino group having at least six (meth)acrylonyl groups per molecule. Ethyl formate (meth) acrylate compound (C) and solvent (D). The positive photosensitive resin composition described above has good pattern contrast and peeling properties. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I796410-B |
priorityDate |
2015-05-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |