| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_47cc435e1d443f13180f7766df104d9d |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-304
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B37-00 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09G1-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-321
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-00 |
| filingDate |
2016-03-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8c35b8099365040e5f5d7c396752912b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_07e9809296ceb6aedbee2f73a57f2e49 |
| publicationDate |
2016-12-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-201641660-A |
| titleOfInvention |
Polishing liquid for CMP and grinding method using same |
| abstract |
The present invention provides a polishing liquid for CMP which is a polishing liquid for CMP for polishing a lanthanoid metal, and contains abrasive grains, a metal oxidizing agent and water, and the metal oxidizing agent has oxidation accompanying the transfer of hydroxide ions. a reduction potential, the oxidation-reduction potential is 0.68 V or more with respect to a standard hydrogen electrode, and the pH of the polishing liquid for CMP is 7.0 to 13.0, and the total content of the abrasive grains and the water content is 100. The content of the abrasive grains is 0.10 parts by mass or more in parts by mass. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I795521-B |
| priorityDate |
2015-03-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |