| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e001ac73af53ce7fb6bbbe075a31d0a8 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C19-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B37-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-304
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B37-04 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B7-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09G1-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C03C19-00 |
| filingDate |
2016-02-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_18f5b333421abdf84ce76981fe748351
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5946904191f9cc00ca01ef0d987efd69
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fcc526c12e9b63c602adb7c619de47e8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_042234a6897b265bce59de525c344f2a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e24ac30e52f024bd7b8f52d0fb4cb9ed
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ee807f66b025becfb237ba2453f60b50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a3a9b00bb731e1d693783370d9f7dbfb
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bb6498ebd3e65b290ee9a62cb74e8f7b |
| publicationDate |
2016-12-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-201641464-A |
| titleOfInvention |
Honing method with negatively charged substrate, and method for manufacturing negatively charged substrate with high surface smoothness |
| abstract |
The present invention provides a polishing method for a negatively-charged substrate which can achieve a high polishing rate and which is excellent in productivity and excellent in surface smoothness. Further, a method of manufacturing a negatively-charged substrate for achieving high surface smoothness is provided.nThe invention relates to a method for polishing a negatively-charged substrate, which is a method for polishing a negatively-charged substrate by using an abrasive slurry containing a composition formula: ABO3 (A represents a group selected from the group consisting of Sr and Ca). At least one element: B represents an oxide and zirconium oxide represented by at least one element selected from the group consisting of Ti, Zr, and Hf, and the polishing method is performed at least once each The polishing step a of polishing the negatively-charged substrate under the condition that the zeta potential of the polishing slurry is positive, and the polishing step b of polishing the negatively-charged substrate under the condition that the zeta potential of the polishing slurry is negative. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I768008-B |
| priorityDate |
2015-02-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |