| abstract |
The present invention is in the field of a method of producing a thin inorganic film on a substrate. In particular, the present invention relates to a process which comprises bringing a compound of the formula (I) into a gaseous or hazy state Ln----M---Xm(I)□ and the compound of the formula (I) The gaseous or hazy state is deposited onto a solid substrate, wherein R1, R2, R3, R4 are independently of each other a hydrogen, alkyl, aryl or SiA3 group, wherein A is an alkyl or aryl group, and R1, R2, R3 At least two of R4 are SiA3 groups, n is an integer from 1 to 4, M is a metal or a semimetal, X is a ligand coordinated to M, and m is an integer from 0 to 4. |