http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-201632996-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fcc0b66123940d1b32783569ebfa2d45 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G14-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G8-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G8-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G8-24 |
| filingDate | 2016-01-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_89abab811069c64e02454132b3ab9bc4 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_28822d7408eab9f123bf757caa7d3cd7 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cfcbea7b62c2c8449da55d2cca7dd61c http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fd3726c45606bedd3fa574f4a8e3d8d1 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_813e0e460b2bf852de31d8762bc4b614 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_200fd164f0946145bf6fafffd4e11966 |
| publicationDate | 2016-09-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-201632996-A |
| titleOfInvention | Resist underlayer film forming composition, resist underlayer film, and method of manufacturing patterned substrate |
| abstract | An object of the present invention is to provide a resist underlayer film forming composition which can form a resist underlayer film which is excellent in solvent resistance, etching resistance, heat resistance and embedding property by using PGMEA or the like as a solvent. The resist underlayer film forming composition of the present invention contains a compound having a carbon-carbon triple bond-containing group and having a partial structure containing an aromatic ring, and a benzene nucleus constituting an aromatic ring in a partial structure. The total count is 4 or more. It is preferable to have a first partial structure represented by the following formula (1) as a partial structure. P1+p2+p3+p4 of the following formula (1) is 1 or more, R1n~R4nAt least one of them is preferably a monovalent group containing a carbon-carbon triple bond. The group is preferably a propargyl group. It is also preferable to have a second partial structure represented by the following formula (2) as a partial structure. □ |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I644999-B http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I639056-B |
| priorityDate | 2015-03-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 217.