| abstract |
The present invention relates to a composition comprising a polymer and a solvent, wherein the polymer comprises: a repeating unit of the following formula (I):n□ wherein: Ar1, Ar2, Ar3 and Ar4 independently represent optionally substituted divalent aromatic groups; X1 and X2 independently represent a single bond, -O-, -C(O)-, -C(O)O -, -OC(O)-, -C(O)NR1-, -NR2C(O)-, -S-, -S(O)-, -SO2- or optionally substituted C1-20 divalent hydrocarbon group Wherein R1 and R2 independently represent H or a C1-20 hydrocarbon group; m is 0 or 1; n is 0 or 1; and o is 0 or 1; and a capping group which does not contain a polymerizable vinyl group and a hydroxyl group. The compositions find particular applicability in the fabrication of semiconductor devices for forming low-k and ultra-low-k dielectric materials. |