| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-50 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-085
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-76
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-032 |
| filingDate |
2016-01-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9b2cbaa9fef0bd8ec66e14cb425cfb01 |
| publicationDate |
2016-08-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-201629632-A |
| titleOfInvention |
Composition, film, blank mask, resist pattern forming method, and method of manufacturing electronic component |
| abstract |
A radiation sensitive or sensitizing ray composition, a film using the composition, a blank mask, a resist pattern forming method, and a method of manufacturing an electronic component, wherein the radiation sensitive or sensitizing ray composition comprises The compound having a molecular weight of 450 or more and 2000 or less represented by the formula (I) described in the specification and an acid generator which generates an acid by irradiation with actinic rays or radiation. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I801042-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I711876-B |
| priorityDate |
2015-01-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |