http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-201628023-A

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filingDate 2015-12-15-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_059f9fb0a4b6abb94fb428b22ec94bf5
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publicationDate 2016-08-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-201628023-A
titleOfInvention Method for producing oxide protective film, oxide protective film, method for producing thin film transistor, thin film transistor and electronic component
abstract A method for producing an oxide protective film and a method thereof, the method for producing an oxide protective film comprising the steps of: coating a semiconductor-containing oxide semiconductor film formed on a substrate with a solvent and 50 atom% or more of indium The metal component of the oxide protects the film precursor solution to form an oxide protective film precursor film; and the oxide protective film precursor film is converted into an oxide protective film having a higher specific resistance than the oxide semiconductor film.
priorityDate 2015-01-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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