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filingDate 2015-08-26-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2016-07-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-201626470-A
titleOfInvention Semiconductor device manufacturing method and semiconductor device
abstract The manufacturing method of the semiconductor device of the present invention comprises the steps of: a preparation step of preparing a semiconductor wafer on which a circuit is formed on a main surface; a attaching step of attaching a semiconductor wafer to an adhesive layer; and a first dividing step Separating a semiconductor wafer attached to the bonding layer along the dicing region to obtain a plurality of semiconductor wafers; and sealing step of attaching the main surfaces of the plurality of semiconductor wafers to the bonding layer The semiconductor wafer is sealed at one time, thereby forming a sealing material layer composed of a semiconductor sealing resin composition on the gap between the side faces of the semiconductor wafer and the back surface of the semiconductor wafer; and a second dividing step formed by the pair of semiconductors The sealant layer of the gap between the sides of the wafer is divided to obtain a plurality of the above-described semiconductor wafers having a sealant layer formed on the side and back sides.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I795696-B
priorityDate 2014-08-29-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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