http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-201623599-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_778fe5aa551806ca134b210927ef0eb8 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D3-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B08B3-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-304 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-42 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D7-50 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D7-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D7-26 |
| filingDate | 2015-12-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f78ff14768eb3d5a6c6e06570bc01f1d http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d71a74443b6c99a7aa0b20a0e1c5f06d http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1a2e8e5b6161819f7b3d7f1b8e8d1512 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e71ea946ccb95eaede0126f8809af9b9 |
| publicationDate | 2016-07-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-201623599-A |
| titleOfInvention | Resistive residue cleaning solution |
| abstract | The invention discloses a cleaning liquid and a composition thereof for removing photoresist residues without fluoride and hydroxylamine. The low-etching photoresist removal residue-free cleaning solution containing no fluoride and hydroxylamine contains (a) an alcohol amine, (b) a solvent, (c) water, (d) a phenol, and (e) an alkynol. Ethoxylated compounds, (f) anthracene and its derivatives, (g) polyols. This low-etching photoresist that removes photoresist residues can quickly remove the cross-linking hardened photoresist after hard chemical, dry etching, ashing, and plasma implantation, and can be removed. Metal lines, vias, and photoresist residues on the metal pad wafers have substantially no attack on the substrate, such as metal aluminum, metallic copper, non-metallic ceria, and the like. The cleaning solution of the invention has a good application prospect in the field of semiconductor wafer cleaning and the like. |
| priorityDate | 2014-12-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 127.