| abstract |
The present invention aims to provide a solution for the poor stability of a polishing fluid prepared from aminosilane-modified abrasive particles, which can significantly increase the pH, nanoparticle size and polishing rate of the system by adding an azole compound. Stability of the period. It can improve the removal rate of the cerium oxide dielectric material to the cerium oxide dielectric material, and improve the pH, the particle size of the nano granules and the stability of the polishing liquid during storage. |