| abstract |
An onium salt compound represented by the following formula (1); in the formula, R11n, R22n, R33n, R44n, R55nAnd R01nRepresents a hydrogen atom, or a monovalent hydrocarbon group; j is 0 or 1; Z+nAnd represents a phosphonium cation represented by the formula (a) or a phosphonium cation represented by the formula (b);n, R200nAnd R300nRepresents a monovalent hydrocarbon group. R400nAnd R500nRepresents a monovalent hydrocarbon group. The onium salt compound contained in the photoresist composition of the present invention acts well as an acid diffusion controlling agent, and as a result, it is possible to construct a pattern profile having a small MEF and LWR, excellent depth of focus, and high resolution. |