| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-3021
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-091
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-1808
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-38
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-327
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-168
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0276
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0274
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2006
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-325 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L33-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 |
| filingDate |
2015-09-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2755db4cf58164bd00e91fcc1d759dcc
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_24ef466fc3607e925bf3e57161456513
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d05ac22b12c7e9df0f388a03e4f0d9d9
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9d773c26933f47f09f8fae9fcf14edf1
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_88bcabb3e0a0101711e37439a9856f96 |
| publicationDate |
2016-06-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-201619709-A |
| titleOfInvention |
Negative pattern forming method, method of manufacturing electronic component, and sensitizing ray-sensitive or radiation-sensitive resin composition |
| abstract |
An object of the present invention is to provide a negative pattern forming method in which a DOF of a resist composition to be used is large, and a film shrinkage in a heat treatment after exposure is suppressed, and an electronic component including the pattern forming method. A method and a sensitizing ray-sensitive or radiation-sensitive resin composition. The negative pattern forming method of the present invention comprises: a film forming step of forming a resist film on a substrate by a resist composition; an exposing step of irradiating the film with actinic rays or radiation; and a heat treatment step, The film irradiated with actinic rays or radiation is subjected to heat treatment; and the developing step develops the heat-treated film using a developing solution containing an organic solvent; the resist composition contains: resin A, including The repeating unit A having a group represented by a specific formula; the resin B, comprising a repeating unit B having a group represented by a specific formula; a compound which generates an acid by irradiation with actinic rays or radiation. |
| priorityDate |
2014-09-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |