| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8cf8d77ac0eff1767b22d2fb9445b64d |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32816
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3244
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02046
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F4-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-36
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67017
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32834 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-36
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-455
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-458
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-46
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-52 |
| filingDate |
2015-08-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b29e5429a4f08e4648420425dd9be9e7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0f6818c3db0019e575717d1423bc50dc
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a85b87c2d4821b06528e8a5237449d74 |
| publicationDate |
2016-06-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-201619433-A |
| titleOfInvention |
Differential extraction reactive gas injector |
| abstract |
One method used to remove material from the surface is ion etching. In some instances, ion etching involves transporting ions and reactive gases toward the substrate while maintaining a lower pressure on portions of the substrate outside of the local high pressure delivery area. The low pressure system is achieved by confining the high pressure reactant transport to a small area and withdrawing excess reactants and by-products through a vacuum (where the reactants and by-products leave the small area and Before entering the larger substrate processing area). The disclosed techniques can be used to increase throughput while minimizing the potential for collisions between ions and other species present in the substrate processing region. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10998167-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11062920-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11289306-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10825652-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10580628-B2 |
| priorityDate |
2014-08-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |