http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-201616583-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_493380437f366253d8deeb16625d21c0 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-7869 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-66742 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-336 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-786 |
| filingDate | 2014-10-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c4f550c357a3894e38c28be113fe1696 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6db8f65b5289bc69bbc57556c825a06c http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e375d6359f5fde0c0dfc4f816b72cd35 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_967808c1509ca55c09f71384762c3293 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b4edb75e19699a95f1067f11db330988 |
| publicationDate | 2016-05-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-201616583-A |
| titleOfInvention | Thin film transistor substrate manufacturing method |
| abstract | A method for fabricating a thin film transistor substrate. The method includes: providing a substrate, and forming a gate on the substrate; forming a gate insulating layer covering the gate, a metal oxide layer and a first photoresist layer on the substrate; and patterning the first photoresist layer to Forming a first photoresist pattern; etching a metal oxide layer not covered by the first photoresist pattern to form a channel; removing portions on both sides of the first photoresist pattern to expose a portion of the via; forming a gate insulating layer a channel and a metal layer of the first photoresist pattern, and forming a second photoresist layer on the metal layer; patterning the second photoresist layer to form a second photoresist pattern; etching is not performed by the second photoresist pattern Covering the metal layer to form a source and a drain; and removing the first photoresist pattern and the second photoresist pattern. |
| priorityDate | 2014-10-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 21.