| abstract |
This invention discloses an onium salt compound represented by formula (1), wherein Z+ is a sulfonium cation represented in formula (a) or an iodonium cation represented in formula (b); Y-N-R5 is a ring structure with carbon number 2~5 and contains a nitrogen atom to be situated between Y and R5; and formula (1) must have a substitutional group -L-CO2- (L is a single bond or a divalent hydrocarbon). The onium salt compound contained in the photoresist composition of this invention can function well as an acid diffusion controller, with the result of building a high-resolution pattern profile with small mask error factor (MEF) and line width roughness (LWR), and excellent depth of focus. |