| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5157cc9d29989d27bd65a85902ddb054 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01S3-225
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01S3-2308
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01S3-2207 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01S3-2308
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01S3-134
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01S3-2251
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01S3-225
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01S3-13
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01S3-036
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01S3-104
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01S3-0014
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01S3-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01S3-2256 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01S3-097
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01S3-134 |
| filingDate |
2015-07-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a761b79ea114e50fec2b4694c9abb882
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_442c2b1d9e85a3b688d84c9d9d70f111
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_17d8b844db8be40bbcd37f545fbfbdd4 |
| publicationDate |
2016-03-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-201611450-A |
| titleOfInvention |
System and method for automatic gas optimization in a two-chamber gas discharge laser system |
| abstract |
This disclosure discloses systems and methods for automatically optimizing gas after refilling in a chamber of a two chamber gas discharge laser. The laser is fired at low power and, if necessary, the gas in the laser chamber of the amplifier is discharged until the discharge voltage meets or exceeds a minimum value without causing the pressure to drop below a minimum. The power output is increased to approximate the desired mode of operation of the laser, and if necessary, the amplifier chamber gas is again released until the voltage and output energy meet or exceed a minimum, or until the pressure is less than a minimum. The gas in the main control oscillator chamber is then discharged as necessary until the output energy of the main control oscillator meets or falls below a maximum value without causing the pressure in the chamber to drop to the minimum value. the following. Although the pressure is adjusted, the bandwidth is also measured and adjusted to remain within the desired range. Once these target values are provided, the process is quickly allowed without manual interaction. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I670750-B |
| priorityDate |
2014-09-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |