http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-201610208-A

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filingDate 2015-06-02-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5669766dbad0e860ece13373341e2962
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publicationDate 2016-03-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-201610208-A
titleOfInvention Film forming device, film forming method, memory medium
abstract A film forming apparatus which is obtained by laminating a molecular layer of an oxide on a surface of a substrate in a vacuum atmosphere formed in a vacuum container to obtain a film forming apparatus, and a raw material gas supply unit for adsorbing the raw material a substrate in the vacuum container, and a source gas containing the raw material is supplied to the substrate; and the atmosphere gas supply unit supplies an ozone atmosphere for forming ozone containing a concentration higher than a concentration at which a chain decomposition reaction is initiated in the vacuum container. An atmosphere gas; an energy supply unit forcibly decomposing the ozone by supplying energy to the ozone atmosphere to generate an oxygen active group, and oxidizing the material adsorbed on the surface of the substrate by the active group to obtain The oxide control unit outputs a control signal by repeating the supply of the material gas, the supply of the atmosphere gas, and the energy supply in a plurality of times; the buffer region is for mitigating the ozone Decomposing causes the pressure in the vacuum vessel to rise, and is arranged to be connected to the vacuum vessel and supply an inert gas; Division means, the line is supplied to the atmosphere in the vacuum container, the vacuum container with respect to the division of the buffer area, while in the decomposition of the generated ozone, the vacuum container with respect to the communication buffer area.
priorityDate 2014-06-04-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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