| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_51d028c578ae85cb937b5b34a5129fbc |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-30438
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-30422
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-31764
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-0453
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-0435
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-303
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-31762 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3177
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76816
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3174
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31144
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0277
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-0207
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L23-5283
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76886
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10B10-00 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G06F17-30 |
| filingDate |
2015-05-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_49ec2e6cd281893e9d79a6391a93ae4b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_12d3c6a0a707dec581e8bd82c4bd51f3
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f90476a2e3bdac6b3b6c14ef74c80abc |
| publicationDate |
2016-02-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-201606536-A |
| titleOfInvention |
Unidirectional metal layer layout using complementary electron beam lithography |
| abstract |
A lithography apparatus suitable for complementary electron beam lithography (CEBL) and a method of complementary electron beam lithography are described. In an embodiment, the layout of the metallization layer for the integrated circuit includes a first region having a plurality of first widths and a first pitch and unidirectional lines parallel to the first direction. The layout also includes a second region having a plurality of second widths and a second pitch parallel to the first direction, the second width and the second pitch being different from the first width and the first spacing. The layout also includes a third region having a plurality of third and third pitches and a unidirectional line parallel to the first direction, the third width and the third pitch being different from the first width and the second width And different from the first pitch and the second pitch. |
| priorityDate |
2014-06-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |