| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_81a5d1f0d5dfdf51d2495345dd56dccc |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02274
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0228
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02211
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02126 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-316 |
| filingDate |
2015-07-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_db51da443b07d6e728020ec495def24b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e4b8912366aa3f12dcd1c2b35840af3d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c75a571432b1b82f8904db050dbc9294
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f5d57bbd4d9cdf5c6d531def5574f658
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6f3a5d98743233b8e7a312d1721a46c2
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b558362e3d50b941d95441769768b120
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9d810634f637b7edcd610a16f0340ba4
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d08fbca0846987097a60449b64475bb1 |
| publicationDate |
2016-02-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-201606116-A |
| titleOfInvention |
Method for depositing oxide film with low etching rate and semiconductor device |
| abstract |
According to an embodiment of the present invention, a method for depositing an oxidized film includes injecting a ruthenium precursor into a chamber with a target loaded therein for adsorbing on the target for a first purge The oxidized film is formed by removing unreacted ruthenium precursors and reaction by-products in the chamber, and by forming a plasma atmosphere in the chamber and supplying a reaction source including one carbon atom. |
| priorityDate |
2014-08-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |