| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2baf849d216e689ecc40ccc931a7a7bc |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0332 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0337
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0276
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0332
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-094
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-091
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D161-34
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G18-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G14-02 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G14-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-26 |
| filingDate |
2015-03-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0207ac1bc5b6dff996919c7180c91bf6
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2d338fa9da212910df6f0916095817b8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_31c3da48141cf33839cfbc6b5598dbc1
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9a2cf3f9243b10468d4363d9faa4776a |
| publicationDate |
2016-02-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-201605914-A |
| titleOfInvention |
Photoresist underlayer film forming composition containing novolac resin containing an aromatic vinyl compound |
| abstract |
The present invention provides a photoresist underlayer film forming composition which has high solubility in a solvent used for lithographic etching which can produce good coating film forming properties and which can reduce sublimates generated during film formation.nA photoresist base film comprising a aromatic ring structure containing an aromatic ring-containing compound (A) and reacting with a vinyl group of the aromatic vinyl compound (B) to form a photoresist base resin having a structural group (C) Things. In particular, the aromatic ring structure of the compound (A) containing an aromatic ring is a structure containing an aromatic ring constituting a polymer chain of a novolak resin. The aromatic vinyl compound (B) is of the formula (1):nâ–ˇnIllustrated are, in particular, styrene, 2-vinylnaphthalene, 4-tert-butylstyrene, or 4-tert-butoxystyrene. The structural group (C) is of the formula (2):nâ–ˇnShown. The compound (A) containing an aromatic ring is an aromatic amine compound or a compound containing a phenolic hydroxyl group. The novolak resin is a resin produced by reacting an aromatic amine compound or a compound containing a phenolic hydroxyl group with an aldehyde or a ketone. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I697738-B |
| priorityDate |
2014-03-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |